Jumps and Hysteresis Effects in CH4-H2 Plasma Discharges
نویسندگان
چکیده
In typical conditions of diamond film synthesis in a EACVD device ~JllectronAssisted Chemical Vapor Deposition), we report on the sudden jumps, bistability, multistability and negative resistance phenomena in methane-hydrogen mixture discharge plasma. We studied the variations of these phenomena with gas pressure, filament current. The difference of discharge characteristic between pure hydrogen and methane-hydrogen mixture system is presented.
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